Gottlieb S.oehrlein

Biography

Education  Ph.D., State University of New York–Albany, 1981 Research Interests  Applications of low-temperature plasma science and technology to materials processing, surface chemistry and physics of thin film growth, etching and modification, plasma-surface and plasma-polymer interactions, in-situplasma and surface diagnostics, physics and chemistry of ion-induced surface processes and of imaging and templating materials, nanoscale structure and device fabrication and characterization, surface and bulk defects of materials. Background  Download Profesor Oehrlein's C.V. (PDF) Prior to joining the A. James Clark School of Engineering at the University of Maryland in 2000, Professor Oehrlein was a member of the Department of Physics faculty at the State University of New York–Albany from 1993 to 2000, and a research staff member in IBM's Division of Research at the T.J. Watson Research Center, in Yorktown Heights, NY. Honors and Awards  2010 IBM Faculty Award 2005 Plasma Prize, Plasma Science and Technology Division, American Vacuum Society 2003 Invention of the Year Finalist for Method and Device for Nanoscale Plasma Processing of Materials (US Patent #7470329), UMD Office of Technology Commercialization 2002 IBM Faculty Award Fellow, International Union of Pure and Applied Chemistry (2000) Fellow, American Vacuum Society (1998) Thinker Award of Tegal Corporation, SEMICON West (1993) Electronics Division Award of the Electrochemical Society (1992) Six IBM Invention Plateau Awards (1982-1993) IBM Outstanding Technical Achievement Award (1989) Solid State Science and Technology Young Author's Award of the Electrochemical Society (1985) State University of New York Chancellor's Honors Convocation Award for Academic Excellence and a Distinguished Dissertation (1982) Fellow, Institute of International Education, New York (1980) Presidential Fellow, State University of New York, Albany (1978-1981) Education  Ph.D., State University of New York–Albany, 1981 Research Interests  Applications of low-temperature plasma science and technology to materials processing, surface chemistry and physics of thin film growth, etching and modification, plasma-surface and plasma-polymer interactions, in-situplasma and surface diagnostics, physics and chemistry of ion-induced surface processes and of imaging and templating materials, nanoscale structure and device fabrication and characterization, surface and bulk defects of materials. Background  Download Profesor Oehrlein's C.V. (PDF) Prior to joining the A. James Clark School of Engineering at the University of Maryland in 2000, Professor Oehrlein was a member of the Department of Physics faculty at the State University of New York–Albany from 1993 to 2000, and a research staff member in IBM's Division of Research at the T.J. Watson Research Center, in Yorktown Heights, NY. Honors and Awards  2010 IBM Faculty Award 2005 Plasma Prize, Plasma Science and Technology Division, American Vacuum Society 2003 Invention of the Year Finalist for Method and Device for Nanoscale Plasma Processing of Materials (US Patent #7470329), UMD Office of Technology Commercialization 2002 IBM Faculty Award Fellow, International Union of Pure and Applied Chemistry (2000) Fellow, American Vacuum Society (1998) Thinker Award of Tegal Corporation, SEMICON West (1993) Electronics Division Award of the Electrochemical Society (1992) Six IBM Invention Plateau Awards (1982-1993) IBM Outstanding Technical Achievement Award (1989) Solid State Science and Technology Young Author's Award of the Electrochemical Society (1985) State University of New York Chancellor's Honors Convocation Award for Academic Excellence and a Distinguished Dissertation (1982) Fellow, Institute of International Education, New York (1980) Presidential Fellow, State University of New York, Albany (1978-1981)

Research Interest

Applications of low-temperature plasma science and technology to materials processing, surface chemistry and physics of thin film growth, etching and modification, plasma-surface and plasma-polymer interactions, in-situplasma and surface diagnostics, physics and chemistry of ion-induced surface processes and of imaging and templating materials, nanoscale structure and device fabrication and characterization, surface and bulk defects of materials.