Dr Nancy Lumpkin

Biography

Dr Nancy Lumpkin ex-Research Fellow, Cavendish Laboratory, University of Cambridge, UK After graduation in 1983, Nancy started working for Intel where she managed the photolithography and etch production processes for the fabrication of silicon CMOS ULSI memory and ASIC devices. In 1989 she migrated to Australia and joined the CSIRO GaAs IC Facility where she developed and fabricated high electron mobility transistors (HEMTs) and HEMT-based amplifiers. In 1996 she joined the Semiconductor Nanofabrication Facility (SNF), now part of the CRC for Quantum Computer Technology, and rose to the senior position of Process Development Engineer. In 2002 Dr Lumpkin was appointed to Cambridge University as a Research Fellow. Nancy has a distinguished career with several international conference presentations and over 50 publications in international journals. She also holds the patents covering small qubit quantum computer device prototype process Dr Lumpkin brings to Quantum-Ï€ a wealth of knowledge based upon: Eighteen years experience in semiconductor device production, research and development. Designed and patented a novel process for the fabrication of quantum computer devices. Recently, this patent has been instrumental in attracting over AU$14M in Australian and US government funding, in support of the quantum computer project. Experience in integrated circuit production process development, with critical dimensions on the micron-to-nanometer scale. Expertise in photolithography using positive, negative and reversing resists for critical dimensions down to 0.2 microns. Experienced using Quintel, Ultratech, Perkin Elmer, Nikon and Karl Suiss contact and stepper aligners. Strong knowledge in plasma etch, thermal and CVD deposition processes. Nanofabrication Process Manager for electron beam and photolithography processes at the Semiconductor Nanofabrication Facility, UNSW. Experience in process optimization using statistically designed experiments and response surface modeling techniques. Experience in process characterization using TEM, AEM, SIMS, SEM and AFM analytical techniques.

Research Interest

Dr Nancy Lumpkin ex-Research Fellow, Cavendish Laboratory, University of Cambridge, UK After graduation in 1983, Nancy started working for Intel where she managed the photolithography and etch production processes for the fabrication of silicon CMOS ULSI memory and ASIC devices. In 1989 she migrated to Australia and joined the CSIRO GaAs IC Facility where she developed and fabricated high electron mobility transistors (HEMTs) and HEMT-based amplifiers. In 1996 she joined the Semiconductor Nanofabrication Facility (SNF), now part of the CRC for Quantum Computer Technology, and rose to the senior position of Process Development Engineer. In 2002 Dr Lumpkin was appointed to Cambridge University as a Research Fellow. Nancy has a distinguished career with several international conference presentations and over 50 publications in international journals. She also holds the patents covering small qubit quantum computer device prototype process Dr Lumpkin brings to Quantum-Ï€ a wealth of knowledge based upon: Eighteen years experience in semiconductor device production, research and development. Designed and patented a novel process for the fabrication of quantum computer devices. Recently, this patent has been instrumental in attracting over AU$14M in Australian and US government funding, in support of the quantum computer project. Experience in integrated circuit production process development, with critical dimensions on the micron-to-nanometer scale. Expertise in photolithography using positive, negative and reversing resists for critical dimensions down to 0.2 microns. Experienced using Quintel, Ultratech, Perkin Elmer, Nikon and Karl Suiss contact and stepper aligners. Strong knowledge in plasma etch, thermal and CVD deposition processes. Nanofabrication Process Manager for electron beam and photolithography processes at the Semiconductor Nanofabrication Facility, UNSW. Experience in process optimization using statistically designed experiments and response surface modeling techniques. Experience in process characterization using TEM, AEM, SIMS, SEM and AFM analytical techniques.