Wei Shiqiang

Biography

Dr. Xu Faqiang, male, born in Aug.1963, research fellow, Ph.D. supervisor. He graduated from Dept. of Chemistry of Hebei teacher's University in 1987. In 1989 he was enrolled by Lanzhou Institute of Chemical Physics of CAS and obtained doctoral degree in 1995. He did postdoctoral research in National Synchrotron Radiation Laboratory of USTC from Mar.1995 to Jan.1997, exploring ultra-high vacuum growth of metal oxide thin films, and the electronic structures of metal (oxide) / semiconductor (metal) surface and interface by synchrotron radiation photoemission spectroscopy. He worked as a senior visiting scholar in HASYLAB of DESY National Synchrotron Radiation Laboratory in Hamburg, Germany, from Nov.1999 to Feb.2000, and did cooperative research in Hiroshima Synchrotron Radiation Research Center, Japan, from Oct.2002 to Nov.2002. Main works in recent years: taking part in the construction of surface physics experiment station of “Phase II project of National Synchrotron Radiation Laboratory” (finished); taking charge of a project of Tenth Five-year Plan and “211” Project (finished); joining a project of National Natural Science Foundation of China (finished); currently taking charge of two projects of National Natural Science Foundation of China

Research Interest

Currently his main interests include: developmemnt of synchrotron radiation photoemission spectroscopy (SRPES) related techniques and their applications; surface and interface structure of magnetic, optical, electrical components of inorganic and organic semiconductors; growth and characterization of nano-structure surfaces.