Roland Kaplan
Member of the Technical Board
Nanotechnology
Heidelberg Instruments
Germany
Biography
Mr. Roland Kaplan received his Diploma in Physics from Heidelberg University in 1984. During his studies, he developed software to analyze emissions of nuclear power plants through a project financed by the German Government. Later, at the European Molecular Biology Laboratory (EMBL) in Heidelberg, he took part in the software-supported analysis of fluorescent spectrums. For his Diploma thesis - also at the EMBL - he worked on the upgrade of a Confocal Laser Microscope to a 3D raster scanning microscope. After his studies in 1985, he joined Heidelberg Instruments as a software developer for real time image processing applications and by 1990 he was in charge of the Software Department. With the installation of the first direct write laser lithography systems for wafer fabrication in 1992, he took over various functions in the application group. Later, he was a key player in development of the first UV based large area exposure system, introduced in 1997. Since 2002 he has been leading the Research and Development group at Heidelberg Instruments, responsible for various innovations and technology implementations. Mr. Kaplan has co authored a number of patents in the field of maskless lithography.
Research Interest
Business & Management
