István Bányász

Biography

Pioneer in the application of numerical methods in high-resolution holography (1980's). Achieved submicron resolution at 633 nm in holographic microlithography. Included material MTF and nonlinearity in his diffraction model of high-resolution holography. Performed first systematic microscopic studies of phase holographic gratings. Designed, fabricated and evaluated great variety of integrated optical elements using ion beam techniques. Implemented ionoluminescence in Hungary for the first time.

Research Interest

Physics Applied physics