Habuka Hitoshi
Professor
Division of Materials Science and Chemical Engineering
Yokohama National University
Japan
Biography
School Attended (except graduate school) Niigata University , Faculty of Science , Department of chemistry 1979 , Graduated Graduate School Attended, etc. Kyoto University , Graduate School, Division of Natural Science , Department of chemistry Master Course , 1981 , Completed Hiroshima University , Graduate School, Division of Engineering , Department of chemical engineering Doctor Course , 1996 , Completed Research Career Professor, Yokohama National University , 2002/04 - Ongoing Associate Professor, Yokohama National University , 2000/04 - 2002/03 Shin-Etsu Chemical Co., Ltd. Isobe R&D Center , 1986/04 - 2000/03 Career Research Semicondutor crystal production process and instrument(Si, InP, GaAsP, SiC) Crystal growth Thin film formation Cleaning Heat Surface phenomena(contamination, surface reaction) Transport phenomena and chemical reaction for semiconductor crystal production
Research Interest
Research Field (grants-in-aid-for-scientific-research classification) Applied materials Reaction engineering/Process system Current Subject Silicon epitaxial thin film growth crystal growth,Silicon,Surface Chemical processes on silicon surface Silicon,surface,Chemical reaction Heat quipment using radiation (Infrared, etc) Heat Adsorption and contamination of various molecules contamination , adsorption Analysis and development of cleaning equipment cleaning , quipment
Publications
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Repetition of In Situ Cleaning Using Chlorine Trifluoride Gas for Silicon Carbide Epitaxial Reactor (Kosuke Mizuno, Kohei Shioda, Hitoshi Habuka, Yuuki Ishida and Toshiyuki Ohno) ECS Journal of Solid State Science and Technology vol.5 (2) (p.P12-P15) 2016
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A Method to Adjust Polycrystalline Silicon Carbide Etching Rate Profile by Chlorine Trifluoride Gas (Ken Nakagomi, Shogo Okuyama, Hitoshi Habuka, Yoshinao Takahashi and Tomohisa Kato) Materials Science Forum vol.897 (p. 383-386) 2017
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Susceptor Coating Materials Applicable for SiC Reactor Cleaning (Kohei Shioda, Hitoshi Habuka, Hideki Ito, Shin-ichi Mitani and Yoshinao Takahashi) Materials Science Forum vol.897 (p.99-102) 2017