Xiaoliang Ge
Researcher
Department of Electronic Instrumentation
Delft University of Technology
Netherlands
Biography
Xiaoliang Ge was born in Beijing, China. She received the B.Sc degree in 2010 from South China University of Technology, China, and the M.Sc degree in 2012 from Delft University of Technology, the Netherlands, both in microelectronics. From August 2011 to July 2012, she worked at CMOSIS, Belgium, as an intern student for her master project. The project topic is about the design of a global shutter CMOS image sensor. She is currently a PhD candidate at the Electronic Instrumentation Laboratory of Delft University of Technology, working on the design of ultra low noise CMOS image sensor.
Research Interest
CMOS Image Sensors
Publications
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A CMOS image sensor with nearly unity-gain source follower and optimized column amplifier
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A potential-based characterization of the transfer gate in CMOS image sensors
