Sergey Kosolobov

Biography

Sergey earned his Bachelor’s and Master`s degrees in Physics from Novosibirsk State University in 1999 and 2001, respectively. His research focused on the experimental investigations of the silicon surface morphology transformations during thermal etching with molecular oxygen. In 2002, Sergey was a visiting researcher at the University of Duisburg-Essen, Germany where he investigated the impact of gold adsorption at silicon surfaces by means of Low Energy and Photoemission Electron Microscopy. He received his Candidate of Sciences degree in Condensed Matter Physics at the A.V. Rzhanov Institute of Semiconductor Physics, Siberian Branch of the Russian Academy of Sciences (ISP SBRAS), in 2009. In his thesis “The Structure and Morphology of Si(111) Surface during Oxygen and Gold Adsorption” he investigated the structural and morphological transformations of the atomically clean crystalline silicon surfaces during high temperature oxygen treatments and submonolayer gold deposition.

Research Interest

Applied optics and photonics Nanofabrication and characterization of nanostructured optical and photonic materials with application to biomedicine and optical interconnects