Anil Mane
Professor
Department of Materials Science
Argonne National Laboratory
United States of America
Biography
Anil Mane is a Principal Material Science Engineer in Argonne's Energy Systems division. He has extensive research and development experience in the field of thin film nanostructure materials growth by ALD, CVD, PVD and MBE methods, characterization, and integration into nano-devices. He also has over five years of semiconductor industry R&D experience in thin film process development on high-volume 300mm CVD and ALD production tools and material integration. Mane has more than 60 peer-reviewed publications, more than 10 patents, 30-plus inventions and 3 R&D100 awards (known as the “Oscars of Innovation”).
Research Interest
Research and development of next-generation technologically feasible nanostructure materials design, creation and engineering, especially by ALD/CVD techniques. In-situ materials growth study, focus on surface/interface chemistry, thorough materials and test devices characterizations and search for near-term emerging applications. Identification of new nanotechnology based products, development from concept research to scale-up and technology commercialization. Photodetector, MEMS devices, 2D Materials, Nanocomposites, Functional coatings, Sensors, etc.
Publications
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MOCVD of cobalt oxide thin films: dependence of growth, microstructure, and optical properties on the source of oxidation AU Mane, SA Shivashankar Journal of crystal growth 254 (3), 368-377
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Synthesis of Pt–Pd core–shell nanostructures by atomic layer deposition: application in propane oxidative dehydrogenation to propylene Y Lei, B Liu, J Lu, RJ Lobo-Lapidus, T Wu, H Feng, X Xia, AU Mane, ... Chemistry of Materials 24 (18), 3525-3533
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Titanium-added praseodymium silicate high-k layers on Si (001) T Schroeder, G Lupina, J Dabrowski, A Mane, C Wenger, G Lippert, ... Applied Physics Letters 87 (2), 022902
