Paul S. Ho
Professor
Center for Mechanics of Solids, Structures and Materials
Texas A and M University
United States of America
Biography
Dr. Paul S. Ho is the Director of the Laboratory for Interconnect and Packaging at The University of Texas at Austin. He received his B.S. degree in mechanical engineering from National Chengkung University, Taiwan; M.S. degree in physics from National Tsinghua University, Taiwan; and Ph.D. degree in physics from Rensselaer Polytechnic Institute. He joined the Materials Science and Engineering Department at Cornell University in 1966 and became an Associate Professor in 1972. In 1972, he joined the IBM T.J. Watson Research Center and has held a number of management positions. In 1985, he became Senior Manager of the Interface Science Department. In 1991, he joined the faculty at The University of Texas at Austin and was appointed the Cockrell Family Regents Chair in Materials Science and Engineering. His current research is in the areas of materials and processing science for interconnect and packaging for microelectronics. He received the Outstanding Alumni Achievement Award from National Chengkung University in 1992, the Michel Lerme Award from the International Interconnect Technology Conference in 1999 and the Thomas D. Callinan Award from the Electrochemical Society in 2001. He holds the inventorship of 15 U.S. Patents in microelectronics technology. He has edited six books and published extensively in the area of thin films and materials science for microelectronics. He is a Fellow of the American Physical Society, the American Vacuum Society and IEEE.
Research Interest
Electronic Packaging Materials & Processing, Microelectronic Materials & Processing
Publications
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Wang G, Groothuis S, Ho PS. Effect of packaging on interfacial cracking in Cu/low k damascene structures. InElectronic Components and Technology Conference, 2003. Proceedings. 53rd 2003 May 27 (pp. 727-732). IEEE.
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Ogawa ET, Lee KD, Matsuhashi H, Ko KS, Justison PR, Ramamurthi AN, Bierwag AJ, Ho PS, Blaschke VA, Havemann RH. Statistics of electromigration early failures in Cu/oxide dual-damascene interconnects. InReliability Physics Symposium, 2001. Proceedings. 39th Annual. 2001 IEEE International 2001 (pp. 341-349). IEEE.
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Chae SH, Zhang X, Chao HL, Lu KH, Ho PS, Ding M, Su P, Uehling T, Ramanathan LN. Electromigration lifetime statistics for Pb-free solder joints with Cu and Ni UBM in plastic flip-chip packages. InElectronic Components and Technology Conference, 2006. Proceedings. 56th 2006 Jun (pp. 7-pp). IEEE.